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7lrtttleApplegate,lnc. <br />Consultants for Land, Mineral and Water Development <br />January 7, 1997 <br />Mr. Gary Curtiss <br />Division of Minerals and Geology <br />1313 Sherman Street, <br />Room 2 ] 5 <br />Denver, CO 80203 <br />RECEIVED <br />JAN 081998 <br />Division et Mmerzls ~, (;ep~Q,~y <br />RE: Technical Adequacy Review ,Baseline Resource; File No. M-97-058 <br />Dear Gary: <br />This letter is in response to the December 31, 1997 technical adequacy letter for the above <br />permit. This letter is formatted in the same numerical order as your adequacy letter and aze <br />addressed as follows: <br />1.) The operator is committed to stockpile and replace a minimum of 12 inches of topsoil in <br />Phases 2 and 3. <br />2.) After speaking with the applicant, the inert material brought to the site will be recycled <br />and not used as fill material. As stated in Exhibit D, recycling material on-site is <br />proposed and an on-site plant will be reprocessing asphalt and concrete. This recycled <br />material will be sold as crushed structural fill and is in demand,year-round by the <br />construction industry. <br />3.) Groundwater will not be exposed without an approved well permit. <br />4.) Water is not used in the processing of asphalt on-site. Therefore, no water will enter the <br />settling pond from the asphalt plant. <br />5.) The all fuel tanl: and waste oil tank enclosures will be lined with a plastic liner and <br />covered with six inches of pea gravel. <br />6.) Please find enclosed the monitoring well locations for Phases 2 and 3 proposed in the <br />draft well mitigation plan. <br />The anticipated effects of the slurry wall on nearby property, in reference to down <br />gradient shadow, lowered alluvial aquifer, and property potentially affected by an up- <br />gradient bulge are addressed as follows: <br />11990 Grant Street, Suite 304 • Denve~rrr,1~Colorado 80233 • (303) 452-6611 • Fax (303) 452-2759 <br />.-. _.. ~.r~l~..~._ L.~..a:.s'.ca..~I~..'aY~ui;~_r ...G:,ir:;f_fci.• ~~i• ~ ,.u.~.,n~is-::;.;.V2s~: ,.zv.~s,.y.::+:~'.,'i~'. i~e•,a~gy i.+;l'e'.J~d...,;.:,:._.iid <br />